Patterns for Museums - EVA 2008

Abstract: Due to the increasing demands of the customers and changes in use, museums these days are faced with great challenges. On the one hand, they have to serve traditional customers, on the other hand, their web presences become more and more important, even essential, but both parts can be rarely realised completely for cost reasons. Our focus is on layout development because it is an important part of the whole development process of websites that is able to influence the perception and acceptance of the application by users. To ease the layout development and make it flexible, we intend to detect and extract layout components and concepts with the aim to build patterns. Such patterns help to realise adaptive applications that are appropriate to the abilities and demands of users, provider, and technical equipment. This paper gives a short introduction to the patterns for museums approach.

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